DNP, Canon, and Kioxia Awarded Prize for Excellence at the 49th Environmental Awards for Energy-Saving Processing Technology for the advanced semiconductor manufacturing by NIL
Tokyo, May 10, Dai Nippon Printing Co., Ltd. (DNP) is pleased to announce that the Energy-Saving Processing Technology for the advanced semiconductor manufacturing by Nano-Imprint Lithography (NIL) jointly developed by DNP, Canon Inc., and Kioxia Corporation has been awarded the Prize for Excellence at the 49th Environmental Awards1, sponsored by the National Institute for Environmental Studies and the Nikkan Kogyo Shimbun and supported by the Ministry of the Environment.
These three companies have succeeded nanoscale pattern transfers by NIL, which is required for the cutting-edge semiconductors such as five nanometre nodes generation. A nanometre is one billionth of a meter.
This NIL technology was recognised for power reduction method for the pattern transfer process to approximately 10% of conventional methods, and for the contributing technology supporting the rapid expansion of the Internet of Things (IoT) society.
NIL technology can be used for fabricating fine feature patterns, i.e., lithography process for semiconductor manufacturing. Unlike conventional light exposure techniques, such as argon fluoride (ArF) immersion technology or Extreme Ultraviolet (EUV) technology, with NIL the patterns are transferred by pressing a template with surface morphologic patterns onto the resin coated on the substrate.
Nano-Imprint Lithography process flow
As a result, the manufacturing process is simple, the equipment scale is small, and it also is possible to fabricate fine feature patterns without increasing power consumption. In addition, since there is no wavelength restriction as in conventional exposure technology using light, the pattern transfer technology is deemed capable of being applied against the further pattern shrinkage requirements expected in the future. Promise is also held out for the application of this manufacturing technology over an extended period of term without the need to boost manufacturing power consumption.
DNP is engaged in R&D in a broad range of fields, including the high resolution pattern fabrication for semiconductors, and the power consumption reduction in semiconductor manufacturing. At the same time, with a focus on nanoscale semiconductor technology, we will respond to semiconductor application needs that are expanding into various areas of society.