DNP Strengthens Nanoimprint Lithography Template Volume Productions System

Dai Nippon Printing Co., Ltd. (DNP) will make a four billion yen capitalinvestment in 10nm scale nanoimprint lithography (NIL¹) templates,aiming to strengthen volume production systems in the face of forecasts forincreased demand, in addition to realizing lower costs. NIL templates are usedwhen configuring the circuit patterns of 3D NAND flash memories that are thememory media in digital products, and DNP boasts a longstanding focus on NILtemplate provision and development.

[Capital Investment]

Demand for NAND flash memory has undergone sharp increases in recent years.In particular, 3D NAND flash memory stacks memory cells vertically, making itpossible to achieve dramatic expansions in data capacity, and as a result isforecast to see significantly increased demand from smartphones and data centers.NAND flash memory saw around US$30 billion in shipments in 2015, which is expectedto rise to US$50 billion by 2018, with 70% of that figure expected to be accountedfor by 3D NAND flash memory². At the same time, with current photolithographytechnology-based semiconductor manufacturing techniques, it is difficult torespond to demands for complicated 3D structured processes, presenting the challengeof high cost manufacturing equipment and higher cost production.

With NIL-driven manufacturing methods, however, it is possible to directlytransfer and replicate the circuit pattern from the template, facilitating manufactureon relative low cost lithography devices, without having to use high cost opticalequipment. Innovative 3D NAND flash memory-based semiconductor manufacturingtechniques are also in the spotlight as they are seen leading to cost reductionsof approximately 30% compared to current photolithography technology-based manufacturingtechniques.    

[Strengthened Volume Production]

DNP has developed the templates necessary for the NIL process since 2003.In addition to engaging in joint development with Toshiba Corporation and CanonInc., since 2009, the Company has also made investments of seven billion yento date, and in 2015 established a mass production system for 20nm node templates.DNP has also successfully developed a master template that serves as the originalproduction master for 10nm scale NIL plates, and replica templates reproducedfrom the master template.   

Global semiconductor manufacturers are strengthening NIL-driven semiconductormanufacturing techniques along with production systems, in answer to demandsfor reducing 3D NAND flash memory manufacturing costs and further miniaturization.In order to stay abreast of such developments, in this latest development DNPwill make capital investments amounting to four billion yen in multi-beam lithographicdevices that perform high resolution, high speed EB lithography, and dry etchingrelated process equipment, aiming to strengthen mass production systems in responseto increased NIL template demand.    

[Looking Ahead]

DNP aims for sales of approximately 10 billion yen from NIL templates in2019, by strengthening development and production systems in answer to demandsfor further miniaturization and lower cost semiconductors.

1: A microfabrication technique capable of the stable and low cost transferof nano meter to micro meter level patterns by compressing metal molds intothe resist on the surface of the substrate.

2: According to forecasts from Gartner Inc.

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